Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor

J. R. Babcock; A. Wang; A. W. Metz; N. L. Edleman; M. V. Metz; M. A. Lane; C. R. Kannewurf; T. J. Marks

Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor

J. R. Babcock^*, A. Wang, A. W. Metz, N. L. Edleman, M. V. Metz, M. A. Lane, C. R. Kannewurf, T. J. Marks

^*Corresponding author for this work

Chemistry

Research output: Contribution to journal › Article › peer-review

Abstract

The transparent conducting CdO thin film growth was studied using a highly volatile, thermally and air-stable cadmium precursor. The example of Cd-containing film growth was presented using metal-organic chemical vapour deposition (MOCVD) using a coordination complex as the precursor. The charge transport properties were compared and favourable results were obtained with the highest conductivities for CdO thin films grown by magnetron sputtering.

Original language	English (US)
Pages (from-to)	239-242
Number of pages	4
Journal	Advanced Materials
Volume	13
Issue number	21
State	Published - Nov 2 2001

ASJC Scopus subject areas

General Materials Science
Mechanics of Materials
Mechanical Engineering

Cite this

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title = "Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor",

abstract = "The transparent conducting CdO thin film growth was studied using a highly volatile, thermally and air-stable cadmium precursor. The example of Cd-containing film growth was presented using metal-organic chemical vapour deposition (MOCVD) using a coordination complex as the precursor. The charge transport properties were compared and favourable results were obtained with the highest conductivities for CdO thin films grown by magnetron sputtering.",

author = "Babcock, {J. R.} and A. Wang and Metz, {A. W.} and Edleman, {N. L.} and Metz, {M. V.} and Lane, {M. A.} and Kannewurf, {C. R.} and Marks, {T. J.}",

year = "2001",

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language = "English (US)",

volume = "13",

pages = "239--242",

journal = "Advanced Materials",

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T1 - Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor

AU - Babcock, J. R.

AU - Wang, A.

AU - Metz, A. W.

AU - Edleman, N. L.

AU - Metz, M. V.

AU - Lane, M. A.

AU - Kannewurf, C. R.

AU - Marks, T. J.

PY - 2001/11/2

Y1 - 2001/11/2

N2 - The transparent conducting CdO thin film growth was studied using a highly volatile, thermally and air-stable cadmium precursor. The example of Cd-containing film growth was presented using metal-organic chemical vapour deposition (MOCVD) using a coordination complex as the precursor. The charge transport properties were compared and favourable results were obtained with the highest conductivities for CdO thin films grown by magnetron sputtering.

AB - The transparent conducting CdO thin film growth was studied using a highly volatile, thermally and air-stable cadmium precursor. The example of Cd-containing film growth was presented using metal-organic chemical vapour deposition (MOCVD) using a coordination complex as the precursor. The charge transport properties were compared and favourable results were obtained with the highest conductivities for CdO thin films grown by magnetron sputtering.

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M3 - Article

AN - SCOPUS:37649026069

SN - 0935-9648

VL - 13

SP - 239

EP - 242

JO - Advanced Materials

JF - Advanced Materials

IS - 21

ER -

Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor

Abstract

ASJC Scopus subject areas

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