Transparent conducting oxides at high aspect ratios by ALD

Keyphrases

• Atomic Layer Deposition 100%
• Transparent Conducting Oxide 100%
• High Aspect Ratio 100%
• Exposure Time 66%
• Electronic Materials 33%
• Wide Bandgap 33%
• Visible Region 33%
• Mutually Exclusive 33%
• Long-term Exposure 33%
• N-type Semiconductor 33%
• Semiconductor Materials 33%
• Deposition Methods 33%
• Composition Stoichiometry 33%
• Copyright 33%
• High Conductivity 33%
• High Carrier Mobility 33%
• Surface Film 33%
• Short-term Exposure 33%
• High Optical Transmittance 33%
• Oxygen Stoichiometry 33%
• Deposition Area 33%

Engineering

• Exposure Time 100%
• Atomic Layer Deposition 100%
• High Aspect Ratio 100%
• Surface Film 33%
• Outer Surface 33%
• Deposition Method 33%
• Deposition Area 33%
• Semiconductor Material Types 33%
• Phase Composition 33%
• Band Gap 33%
• Reaction Stoichiometry 33%
• Carrier Mobility 33%

Material Science

• Transparent Conducting Oxide 100%
• Carrier Mobility 33%
• Electronic Materials 33%
• Semiconductor Material Types 33%
• Film 33%
• Surface (Surface Science) 33%
• Phase Composition 33%