@article{c3f9f35437744706b6ab058bfb8f6201,
title = "Trapping Layers Prevent Dopant Segregation and Enable Remote Doping of Templated Self-Assembled InGaAs Nanowires",
abstract = "Selective area epitaxy is a promising approach to define nanowire networks for topological quantum computing. However, it is challenging to concurrently engineer nanowire morphology, for carrier confinement, and precision doping, to tune carrier density. We report a strategy to promote Si dopant incorporation and suppress dopant diffusion in remote doped InGaAs nanowires templated by GaAs nanomembrane networks. Growth of a dilute AlGaAs layer following doping of the GaAs nanomembrane induces incorporation of Si that otherwise segregates to the growth surface, enabling precise control of the spacing between the Si donors and the undoped InGaAs channel; a simple model captures the influence of Al on the Si incorporation rate. Finite element modeling confirms that a high electron density is produced in the channel.",
keywords = "atom probe tomography, modeling, nanowire growth, remote doping",
author = "Chunyi Huang and Didem Dede and Nicholas Morgan and Valerio Piazza and Xiaobing Hu and {Fontcuberta i Morral}, Anna and Lauhon, {Lincoln J.}",
note = "Funding Information: L.J.L. and C.H. acknowledge the support of NSF DMR-1611341 and DMR-1905768. Atom-probe tomography was performed at the Northwestern University Center for Atom-Probe Tomography (NUCAPT). The LEAP tomograph at NUCAPT was purchased and upgraded with grants from the NSF-MRI (DMR-0420532) and ONR-DURIP (N00014-0400798, N00014-0610539, N00014-0910781, and N00014-1712870) programs. NUCAPT received support from the MRSEC program (NSF DMR-1720139) at the Materials Research Center, the SHyNE Resource (NSF ECCS-2025633), and the Initiative for Sustainability and Energy (ISEN) at Northwestern University. This work made use of the EPIC facility of the NUANCE Center at Northwestern University, which has received support from the Soft and Hybrid Nanotechnology Experimental (SHyNE) Resource (NSF ECCS-1542205), the MRSEC program (NSF DMR1720139) at the Materials Research Center, the International Institute for Nanotechnology (IIN), the Keck Foundation, and the State of Illinois, through the IIN. Authors from EPFL acknowledge funding through the NCCR QSIT from SNSF. D.D. thanks Santhanu Panikar Ramanandan and Victor Boureau for useful discussions. Publisher Copyright: {\textcopyright} 2023 The Authors. Published by American Chemical Society.",
year = "2023",
month = jul,
day = "26",
doi = "10.1021/acs.nanolett.3c00281",
language = "English (US)",
volume = "23",
pages = "6284--6291",
journal = "Nano letters",
issn = "1530-6984",
publisher = "American Chemical Society",
number = "14",
}