Tribological properties of diamond films grown by plasma-enhanced chemical vapor deposition

M. S. Wong*, R. Meilunas, T. P. Ong, R. P.H. Chang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

51 Scopus citations


Uniform and continuous diamond films have been deposited on Si, Mo, and many other substrates by plasma-enhanced chemical vapor deposition. We have developed processes to enhance the adhesion of diamond films to metal substrates for tribological applications. The tribological properties of the diamond films are found to be significantly different depending on their morphology, grain size, and roughness. However, under all cases tested using a ring-on-block tribotester, it is found that for diamond films with a small grain size of 1-3 μm, the coefficient of friction of the diamond films sliding against a steel ring under lubrication of a jet of mineral oil is about 0.04.

Original languageEnglish (US)
Pages (from-to)2006-2008
Number of pages3
JournalApplied Physics Letters
Issue number20
StatePublished - 1989

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)


Dive into the research topics of 'Tribological properties of diamond films grown by plasma-enhanced chemical vapor deposition'. Together they form a unique fingerprint.

Cite this