Tunable Radiation Response in Hybrid Organic-Inorganic Gate Dielectrics for Low-Voltage Graphene Electronics

Heather N. Arnold, Cory D. Cress, Julian J. McMorrow, Scott W. Schmucker, Vinod K. Sangwan, Laila Jaber-Ansari, Rajan Kumar, Kanan P. Puntambekar, Kyle A. Luck, Tobin J. Marks*, Mark C. Hersam

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

13 Scopus citations


Solution-processed semiconductor and dielectric materials are attractive for future lightweight, low-voltage, flexible electronics, but their response to ionizing radiation environments is not well understood. Here, we investigate the radiation response of graphene field-effect transistors employing multilayer, solution-processed zirconia self-assembled nanodielectrics (Zr-SANDs) with ZrOx as a control. Total ionizing dose (TID) testing is carried out in situ using a vacuum ultraviolet source to a total radiant exposure (RE) of 23.1 μJ/cm2. The data reveal competing charge density accumulation within and between the individual dielectric layers. Additional measurements of a modified Zr-SAND show that varying individual layer thicknesses within the gate dielectric tuned the TID response. This study thus establishes that the radiation response of graphene electronics can be tailored to achieve a desired radiation sensitivity by incorporating hybrid organic-inorganic gate dielectrics.

Original languageEnglish (US)
Pages (from-to)5058-5064
Number of pages7
JournalACS Applied Materials and Interfaces
Issue number8
StatePublished - Mar 2 2016


  • chemical vapor deposition graphene
  • field-effect transistor
  • hybrid dielectrics
  • low-voltage electronics
  • radiation effects
  • total ionizing dose

ASJC Scopus subject areas

  • Materials Science(all)


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