Tuning the spring constant of cantilever-free tip arrays

Daniel J. Eichelsdoerfer; Keith A. Brown; Radha Boya; Wooyoung Shim; Chad A Mirkin

doi:10.1021/nl304268u

Tuning the spring constant of cantilever-free tip arrays

Daniel J. Eichelsdoerfer, Keith A. Brown, Radha Boya, Wooyoung Shim, Chad A Mirkin^*

^*Corresponding author for this work

Chemistry

Research output: Contribution to journal › Article › peer-review

18 Scopus citations

Abstract

A method to measure and tune the spring constant of tips in a cantilever-free array by adjusting the mechanical properties of the elastomeric layer on which it is based is reported. Using this technique, large-area silicon tip arrays are fabricated with spring constants tuned ranging from 7 to 150 N/m. To illustrate the benefit of utilizing a lower spring constant array, the ability to pattern on a delicate 50 nm silicon nitride substrate is explored.

Original language	English (US)
Pages (from-to)	664-667
Number of pages	4
Journal	Nano Letters
Volume	13
Issue number	2
DOIs	https://doi.org/10.1021/nl304268u
State	Published - Feb 13 2013

Keywords

Atomic force microscopy
dip-pen nanolithography
hard-tip
polydimethylsiloxane
scanning probe lithography
soft-spring lithography
spring constant

ASJC Scopus subject areas

Bioengineering
Chemistry(all)
Materials Science(all)
Condensed Matter Physics
Mechanical Engineering

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10.1021/nl304268u

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title = "Tuning the spring constant of cantilever-free tip arrays",

abstract = "A method to measure and tune the spring constant of tips in a cantilever-free array by adjusting the mechanical properties of the elastomeric layer on which it is based is reported. Using this technique, large-area silicon tip arrays are fabricated with spring constants tuned ranging from 7 to 150 N/m. To illustrate the benefit of utilizing a lower spring constant array, the ability to pattern on a delicate 50 nm silicon nitride substrate is explored.",

keywords = "Atomic force microscopy, dip-pen nanolithography, hard-tip, polydimethylsiloxane, scanning probe lithography, soft-spring lithography, spring constant",

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AU - Brown, Keith A.

AU - Boya, Radha

AU - Shim, Wooyoung

AU - Mirkin, Chad A

PY - 2013/2/13

Y1 - 2013/2/13

N2 - A method to measure and tune the spring constant of tips in a cantilever-free array by adjusting the mechanical properties of the elastomeric layer on which it is based is reported. Using this technique, large-area silicon tip arrays are fabricated with spring constants tuned ranging from 7 to 150 N/m. To illustrate the benefit of utilizing a lower spring constant array, the ability to pattern on a delicate 50 nm silicon nitride substrate is explored.

AB - A method to measure and tune the spring constant of tips in a cantilever-free array by adjusting the mechanical properties of the elastomeric layer on which it is based is reported. Using this technique, large-area silicon tip arrays are fabricated with spring constants tuned ranging from 7 to 150 N/m. To illustrate the benefit of utilizing a lower spring constant array, the ability to pattern on a delicate 50 nm silicon nitride substrate is explored.

KW - Atomic force microscopy

KW - dip-pen nanolithography

KW - hard-tip

KW - polydimethylsiloxane

KW - scanning probe lithography

KW - soft-spring lithography

KW - spring constant

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JO - Nano Letters

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Tuning the spring constant of cantilever-free tip arrays

Abstract

Keywords

ASJC Scopus subject areas

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