Tuning the spring constant of cantilever-free tip arrays

Daniel J. Eichelsdoerfer, Keith A. Brown, Radha Boya, Wooyoung Shim, Chad A Mirkin*

*Corresponding author for this work

Research output: Contribution to journalArticle

16 Scopus citations

Abstract

A method to measure and tune the spring constant of tips in a cantilever-free array by adjusting the mechanical properties of the elastomeric layer on which it is based is reported. Using this technique, large-area silicon tip arrays are fabricated with spring constants tuned ranging from 7 to 150 N/m. To illustrate the benefit of utilizing a lower spring constant array, the ability to pattern on a delicate 50 nm silicon nitride substrate is explored.

Original languageEnglish (US)
Pages (from-to)664-667
Number of pages4
JournalNano Letters
Volume13
Issue number2
DOIs
StatePublished - Feb 13 2013

Keywords

  • Atomic force microscopy
  • dip-pen nanolithography
  • hard-tip
  • polydimethylsiloxane
  • scanning probe lithography
  • soft-spring lithography
  • spring constant

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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    Eichelsdoerfer, D. J., Brown, K. A., Boya, R., Shim, W., & Mirkin, C. A. (2013). Tuning the spring constant of cantilever-free tip arrays. Nano Letters, 13(2), 664-667. https://doi.org/10.1021/nl304268u