Two-dimensional growth of continuous Cu2 O thin films by magnetron sputtering

Z. G. Yin; H. T. Zhang; D. M. Goodner; M. J. Bedzyk; R P H Chang; Y. Sun; J. B. Ketterson

doi:10.1063/1.1861117

Two-dimensional growth of continuous Cu2 O thin films by magnetron sputtering

Z. G. Yin^*, H. T. Zhang, D. M. Goodner, M. J. Bedzyk, R P H Chang, Y. Sun, J. B. Ketterson

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

48 Scopus citations

Abstract

We present results on the in situ, two-dimensional growth (as opposed to the more commonly encountered island-coalescence mechanism) of continuous epitaxial Cu2 O films on MgO(011) using dc facing-magnetron sputtering from metallic Cu targets in an oxygen/argon atmosphere. Film growth was studied as a function of deposition time and the dc power applied to the guns. Control of the latter leads to either continuous or island-/rodlike film morphologies.

Original language	English (US)
Article number	061901
Pages (from-to)	1-3
Number of pages	3
Journal	Applied Physics Letters
Volume	86
Issue number	6
DOIs	https://doi.org/10.1063/1.1861117
State	Published - Feb 7 2005

Funding

This research was supported by the MRSEC program of the National Science Foundation (DMR-0076097 and CHE-0201767) at the Materials Research Center of Northwestern University. The authors acknowledge the use of the Northwestern MRSEC central facilities, supported under NSF (DMR-0076097).

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.1063/1.1861117

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title = "Two-dimensional growth of continuous Cu2 O thin films by magnetron sputtering",

abstract = "We present results on the in situ, two-dimensional growth (as opposed to the more commonly encountered island-coalescence mechanism) of continuous epitaxial Cu2 O films on MgO(011) using dc facing-magnetron sputtering from metallic Cu targets in an oxygen/argon atmosphere. Film growth was studied as a function of deposition time and the dc power applied to the guns. Control of the latter leads to either continuous or island-/rodlike film morphologies.",

author = "Yin, {Z. G.} and Zhang, {H. T.} and Goodner, {D. M.} and Bedzyk, {M. J.} and Chang, {R P H} and Y. Sun and Ketterson, {J. B.}",

note = "Funding Information: This research was supported by the MRSEC program of the National Science Foundation (DMR-0076097 and CHE-0201767) at the Materials Research Center of Northwestern University. The authors acknowledge the use of the Northwestern MRSEC central facilities, supported under NSF (DMR-0076097).",

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doi = "10.1063/1.1861117",

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AU - Yin, Z. G.

AU - Zhang, H. T.

AU - Goodner, D. M.

AU - Bedzyk, M. J.

AU - Chang, R P H

AU - Sun, Y.

AU - Ketterson, J. B.

N1 - Funding Information: This research was supported by the MRSEC program of the National Science Foundation (DMR-0076097 and CHE-0201767) at the Materials Research Center of Northwestern University. The authors acknowledge the use of the Northwestern MRSEC central facilities, supported under NSF (DMR-0076097).

PY - 2005/2/7

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N2 - We present results on the in situ, two-dimensional growth (as opposed to the more commonly encountered island-coalescence mechanism) of continuous epitaxial Cu2 O films on MgO(011) using dc facing-magnetron sputtering from metallic Cu targets in an oxygen/argon atmosphere. Film growth was studied as a function of deposition time and the dc power applied to the guns. Control of the latter leads to either continuous or island-/rodlike film morphologies.

AB - We present results on the in situ, two-dimensional growth (as opposed to the more commonly encountered island-coalescence mechanism) of continuous epitaxial Cu2 O films on MgO(011) using dc facing-magnetron sputtering from metallic Cu targets in an oxygen/argon atmosphere. Film growth was studied as a function of deposition time and the dc power applied to the guns. Control of the latter leads to either continuous or island-/rodlike film morphologies.

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Two-dimensional growth of continuous Cu2 O thin films by magnetron sputtering

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