Two-dimensional nanolithography using atom interferometry

A. Gangat*, P. Pradhan, G. Pati, M. S. Shahriar

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Scopus citations


We propose a scheme for the lithography of arbitrary, two-dimensional nanostructures via matter-wave interference. The required quantum control is provided by a π2-π-π2 atom interferometer with an integrated atom lens system. The lens system is developed such that it allows simultaneous control over the atomic wave-packet spatial extent, trajectory, and phase signature. We demonstrate arbitrary pattern formations with two-dimensional Rb87 wave packets through numerical simulations of the scheme in a practical parameter space. Prospects for experimental realizations of the lithography scheme are also discussed.

Original languageEnglish (US)
Article number043606
JournalPhysical Review A - Atomic, Molecular, and Optical Physics
Issue number4
StatePublished - Apr 2005

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics


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