TY - JOUR
T1 - Two-dimensional nanolithography using atom interferometry
AU - Gangat, A.
AU - Pradhan, P.
AU - Pati, G.
AU - Shahriar, M. S.
PY - 2005/4
Y1 - 2005/4
N2 - We propose a scheme for the lithography of arbitrary, two-dimensional nanostructures via matter-wave interference. The required quantum control is provided by a π2-π-π2 atom interferometer with an integrated atom lens system. The lens system is developed such that it allows simultaneous control over the atomic wave-packet spatial extent, trajectory, and phase signature. We demonstrate arbitrary pattern formations with two-dimensional Rb87 wave packets through numerical simulations of the scheme in a practical parameter space. Prospects for experimental realizations of the lithography scheme are also discussed.
AB - We propose a scheme for the lithography of arbitrary, two-dimensional nanostructures via matter-wave interference. The required quantum control is provided by a π2-π-π2 atom interferometer with an integrated atom lens system. The lens system is developed such that it allows simultaneous control over the atomic wave-packet spatial extent, trajectory, and phase signature. We demonstrate arbitrary pattern formations with two-dimensional Rb87 wave packets through numerical simulations of the scheme in a practical parameter space. Prospects for experimental realizations of the lithography scheme are also discussed.
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U2 - 10.1103/PhysRevA.71.043606
DO - 10.1103/PhysRevA.71.043606
M3 - Article
AN - SCOPUS:26944461247
SN - 1050-2947
VL - 71
JO - Physical Review A - Atomic, Molecular, and Optical Physics
JF - Physical Review A - Atomic, Molecular, and Optical Physics
IS - 4
M1 - 043606
ER -