UHV microscopy of surfaces

R. Ai; M. I. Buckett; D. Dunn; T. S. Savage; J. P. Zhang; L. D. Marks

doi:10.1016/0304-3991(91)90219-V

UHV microscopy of surfaces

R. Ai^*, M. I. Buckett, D. Dunn, T. S. Savage, J. P. Zhang, L. D. Marks

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

A brief overview is given of the procedures for preparing clean, well ordered surfaces of thin specimens suitable for UHV surface science with an electron microscope. Examples are presented of results from the gold (001) 5×20 reconstruction and the boron-doped Si(111)√3×√3R30° reconstruction. Results from the electron-beam-induced reduction of NiO in a controlled pressure of 1×10^-7 Torr of Co are described which illustrated the critical role of background gases in electron microscopy.

Original language	English (US)
Pages (from-to)	387-394
Number of pages	8
Journal	Ultramicroscopy
Volume	39
Issue number	1-4
DOIs	https://doi.org/10.1016/0304-3991(91)90219-V
State	Published - Nov 2 1991

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Instrumentation

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10.1016/0304-3991(91)90219-V

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title = "UHV microscopy of surfaces",

abstract = "A brief overview is given of the procedures for preparing clean, well ordered surfaces of thin specimens suitable for UHV surface science with an electron microscope. Examples are presented of results from the gold (001) 5×20 reconstruction and the boron-doped Si(111)√3×√3R30° reconstruction. Results from the electron-beam-induced reduction of NiO in a controlled pressure of 1×10-7 Torr of Co are described which illustrated the critical role of background gases in electron microscopy.",

author = "R. Ai and Buckett, {M. I.} and D. Dunn and Savage, {T. S.} and Zhang, {J. P.} and Marks, {L. D.}",

note = "Funding Information: MIB, TSS, JPZ) on grant number AFOSR 86-0344 DEF, the National Science Foundation on grant number NSF DMR-8514779 (DD) and for the UHV H-9000 the National Science Foundation on grant number NSF DMR 8421209, the Air Force Office of Scientific Research on grant number AFOSR 86-0344 DEF and the Keck Foundation.",

year = "1991",

month = nov,

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doi = "10.1016/0304-3991(91)90219-V",

language = "English (US)",

volume = "39",

pages = "387--394",

journal = "Ultramicroscopy",

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publisher = "Elsevier B.V.",

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TY - JOUR

T1 - UHV microscopy of surfaces

AU - Ai, R.

AU - Buckett, M. I.

AU - Dunn, D.

AU - Savage, T. S.

AU - Zhang, J. P.

AU - Marks, L. D.

N1 - Funding Information: MIB, TSS, JPZ) on grant number AFOSR 86-0344 DEF, the National Science Foundation on grant number NSF DMR-8514779 (DD) and for the UHV H-9000 the National Science Foundation on grant number NSF DMR 8421209, the Air Force Office of Scientific Research on grant number AFOSR 86-0344 DEF and the Keck Foundation.

PY - 1991/11/2

Y1 - 1991/11/2

N2 - A brief overview is given of the procedures for preparing clean, well ordered surfaces of thin specimens suitable for UHV surface science with an electron microscope. Examples are presented of results from the gold (001) 5×20 reconstruction and the boron-doped Si(111)√3×√3R30° reconstruction. Results from the electron-beam-induced reduction of NiO in a controlled pressure of 1×10-7 Torr of Co are described which illustrated the critical role of background gases in electron microscopy.

AB - A brief overview is given of the procedures for preparing clean, well ordered surfaces of thin specimens suitable for UHV surface science with an electron microscope. Examples are presented of results from the gold (001) 5×20 reconstruction and the boron-doped Si(111)√3×√3R30° reconstruction. Results from the electron-beam-induced reduction of NiO in a controlled pressure of 1×10-7 Torr of Co are described which illustrated the critical role of background gases in electron microscopy.

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JO - Ultramicroscopy

JF - Ultramicroscopy

IS - 1-4

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UHV microscopy of surfaces

Abstract

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