UHV microscopy of surfaces

R. Ai*, M. I. Buckett, D. Dunn, T. S. Savage, J. P. Zhang, Laurence Marks

*Corresponding author for this work

Research output: Contribution to journalArticle

7 Scopus citations

Abstract

A brief overview is given of the procedures for preparing clean, well ordered surfaces of thin specimens suitable for UHV surface science with an electron microscope. Examples are presented of results from the gold (001) 5×20 reconstruction and the boron-doped Si(111)√3×√3R30° reconstruction. Results from the electron-beam-induced reduction of NiO in a controlled pressure of 1×10-7 Torr of Co are described which illustrated the critical role of background gases in electron microscopy.

Original languageEnglish (US)
Pages (from-to)387-394
Number of pages8
JournalUltramicroscopy
Volume39
Issue number1-4
DOIs
StatePublished - Nov 2 1991

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Instrumentation

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    Ai, R., Buckett, M. I., Dunn, D., Savage, T. S., Zhang, J. P., & Marks, L. (1991). UHV microscopy of surfaces. Ultramicroscopy, 39(1-4), 387-394. https://doi.org/10.1016/0304-3991(91)90219-V