UHV microscopy of surfaces

L. D. Marks*, R. Ai, J. E. Bonevich, M. I. Buckett, D. Dunn, J. P. Zhang, M. Jacoby, P. C. Stair

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

17 Scopus citations


Results are reported using UHV electron microscopy to determine the role of background gases in influencing surface damage experiments and on the gold (001) surface prepared by ion-beam cleaning/thinning and annealing. In maximum valence oxides the end product is a higher-symmetry oxide or metal in UHV, but in a non-UHV environment secondary reactions take place. No evidence is found for electronic damage of non-maximal valence oxides, only sputtering and electron-stimulated reactions. For the gold (001) surface we have reproduced conventional surface-science preparations using ion-beam cleaning and annealing to produce the known reconstructed hexagonal monolayer on the surface.

Original languageEnglish (US)
Pages (from-to)90-102
Number of pages13
Issue number1-4
StatePublished - Aug 1991

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Instrumentation


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