Ultrathin CNx overcoats for 1 Tb/in2 hard disk drive systems

De Jun Li*, Murat U. Guruz, Yip-Wah Chung

*Corresponding author for this work

Research output: Contribution to conferencePaperpeer-review

Abstract

Carbon nitride films were grown on silicon and hard disk substrates using pulsed dc magnetron sputtering in a single cathode deposition system. Substrates were mounted on a specially designed rotating holder that allowed 45° tilt angle and substrate rotation about the surface normal up to 20 rpm. AFM scans over 10×10 μm2 showed that 50 nm thick CN X films prepared under optimum substrate bias conditions have r.m.s. surface roughness almost four times lower than those prepared without substrate tilt and rotation. We observed a two-fold reduction in corrosion damage for hard disk substrates with 1 nm CNX overcoats deposited with substrate tilt and rotation. This improved performance is likely a result of more efficient and uniform momentum transfer parallel to the surface during deposition in this configuration.

Original languageEnglish (US)
Pages61-64
Number of pages4
StatePublished - Dec 1 2003
EventSTLE/ASME Joint International Tribology Conference and Exhibition - San Francisco, CA, United States
Duration: Oct 21 2001Oct 24 2001

Other

OtherSTLE/ASME Joint International Tribology Conference and Exhibition
CountryUnited States
CitySan Francisco, CA
Period10/21/0110/24/01

ASJC Scopus subject areas

  • Engineering(all)

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