Unconventional approaches for advanced nanotechnology

Since chemists and materials scientists have been seeking for unconventional routes to synthesize and fabricate novel patterns for applied nanotechnology, we introduced useful functional polymers, which can be patternable on a variety of substrates to fabricate devices with specific functions. We introduce new silicon elustomeric polymers as a stamp material for high fidelity in nano-scale soft lithography. We also fabricated elastic photopatterns by synthesizing photocurable PDMS prepolymers. Photopatternable polymers with specific molecular recognition functions were also employed to fabricate functional patterns with specific functions for our diverse applications.