Unconventional approaches for advanced nanotechnology

Kyung M. Choi, Kenneth J. Shea, John A. Rogers

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Since chemists and materials scientists have been seeking for unconventional routes to synthesize and fabricate novel patterns for applied nanotechnology, we introduced useful functional polymers, which can be patternable on a variety of substrates to fabricate devices with specific functions. We introduce new silicon elustomeric polymers as a stamp material for high fidelity in nano-scale soft lithography. We also fabricated elastic photopatterns by synthesizing photocurable PDMS prepolymers. Photopatternable polymers with specific molecular recognition functions were also employed to fabricate functional patterns with specific functions for our diverse applications.

Original languageEnglish (US)
Title of host publicationAssembly at the Nanoscale
Subtitle of host publicationToward Functional Nanostructured Materials
Pages424-428
Number of pages5
Volume901
StatePublished - Dec 1 2005
Event2005 MRS Fall Meeting - Boston, MA, United States
Duration: Nov 28 2005Dec 2 2005

Other

Other2005 MRS Fall Meeting
Country/TerritoryUnited States
CityBoston, MA
Period11/28/0512/2/05

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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