Fingerprint
Dive into the research topics of 'Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field'. Together they form a unique fingerprint.- Sort by
- Weight
- Alphabetically
Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field
John A. Rogers, Kateri E. Paul, Rebecca J. Jackman, George M. Whitesides*
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
294
Scopus
citations