Using interferometric lithography to make large-area two-dimensional nanoarrays

Wang Hua Xiang; Yi Zhi Tan; Gui Zhong Zhang; Gang Wang; J. B. Ketterson

Using interferometric lithography to make large-area two-dimensional nanoarrays

Wang Hua Xiang, Yi Zhi Tan^*, Gui Zhong Zhang, Gang Wang, J. B. Ketterson

^*Corresponding author for this work

Physics and Astronomy

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

The uniform light field over a large area, gained by cascaded laser beam expanding, was used to make a large area of 3.23 cm² two-dimensional periodic array structures such as grating and grids by interferometric lithography technique. Arrays were engineered with a spatial period of 300 nm for metallic Ag and Au as well as magnetic material of Ni.

Original language	English (US)
Pages (from-to)	1054-1057
Number of pages	4
Journal	Guangdianzi Jiguang/Journal of Optoelectronics Laser
Volume	14
Issue number	10
State	Published - Oct 2003

Keywords

Interferometric lithography
Nanoarray

ASJC Scopus subject areas

Electrical and Electronic Engineering

Cite this

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title = "Using interferometric lithography to make large-area two-dimensional nanoarrays",

abstract = "The uniform light field over a large area, gained by cascaded laser beam expanding, was used to make a large area of 3.23 cm2 two-dimensional periodic array structures such as grating and grids by interferometric lithography technique. Arrays were engineered with a spatial period of 300 nm for metallic Ag and Au as well as magnetic material of Ni.",

keywords = "Interferometric lithography, Nanoarray",

author = "Xiang, {Wang Hua} and Tan, {Yi Zhi} and Zhang, {Gui Zhong} and Gang Wang and Ketterson, {J. B.}",

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T1 - Using interferometric lithography to make large-area two-dimensional nanoarrays

AU - Xiang, Wang Hua

AU - Tan, Yi Zhi

AU - Zhang, Gui Zhong

AU - Wang, Gang

AU - Ketterson, J. B.

PY - 2003/10

Y1 - 2003/10

N2 - The uniform light field over a large area, gained by cascaded laser beam expanding, was used to make a large area of 3.23 cm2 two-dimensional periodic array structures such as grating and grids by interferometric lithography technique. Arrays were engineered with a spatial period of 300 nm for metallic Ag and Au as well as magnetic material of Ni.

AB - The uniform light field over a large area, gained by cascaded laser beam expanding, was used to make a large area of 3.23 cm2 two-dimensional periodic array structures such as grating and grids by interferometric lithography technique. Arrays were engineered with a spatial period of 300 nm for metallic Ag and Au as well as magnetic material of Ni.

KW - Interferometric lithography

KW - Nanoarray

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M3 - Article

AN - SCOPUS:1342305556

SN - 1005-0086

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JF - Guangdianzi Jiguang/Journal of Optoelectronics Laser

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ER -

Using interferometric lithography to make large-area two-dimensional nanoarrays

Abstract

Keywords

ASJC Scopus subject areas

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