The uniform light field over a large area, gained by cascaded laser beam expanding, was used to make a large area of 3.23 cm2 two-dimensional periodic array structures such as grating and grids by interferometric lithography technique. Arrays were engineered with a spatial period of 300 nm for metallic Ag and Au as well as magnetic material of Ni.
|Original language||English (US)|
|Number of pages||4|
|Journal||Guangdianzi Jiguang/Journal of Optoelectronics Laser|
|State||Published - Oct 2003|
- Interferometric lithography
ASJC Scopus subject areas
- Electrical and Electronic Engineering