Using interferometric lithography to make large-area two-dimensional nanoarrays

Wang Hua Xiang, Yi Zhi Tan*, Gui Zhong Zhang, Gang Wang, J. B. Ketterson

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Scopus citations


The uniform light field over a large area, gained by cascaded laser beam expanding, was used to make a large area of 3.23 cm2 two-dimensional periodic array structures such as grating and grids by interferometric lithography technique. Arrays were engineered with a spatial period of 300 nm for metallic Ag and Au as well as magnetic material of Ni.

Original languageEnglish (US)
Pages (from-to)1054-1057
Number of pages4
JournalGuangdianzi Jiguang/Journal of Optoelectronics Laser
Issue number10
StatePublished - Oct 2003


  • Interferometric lithography
  • Nanoarray

ASJC Scopus subject areas

  • Electrical and Electronic Engineering


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