Volatile, fluorine-free β-ketoiminate precursors for MOCVD growth of lanthanide oxide thin films

N. L. Edleman; J. A. Belot; J. R. Babcock; A. W. Metz; M. V. Metz; C. L. Stern; T. J. Marks

doi:10.1557/proc-623-371

Volatile, fluorine-free β-ketoiminate precursors for MOCVD growth of lanthanide oxide thin films

N. L. Edleman, J. A. Belot, J. R. Babcock, A. W. Metz, M. V. Metz, C. L. Stern, T. J. Marks^*

^*Corresponding author for this work

Chemistry

Research output: Contribution to journal › Conference article › peer-review

2 Scopus citations

Abstract

Lanthanide oxide thin films are of increasing scientific and technological interest to the materials science community. A new class of fluorine-free, volatile, low-melting lanthanide precursors for the metal-organic chemical vapor deposition (MOCVD) of these films has been developed. Initial results from a full synthetic study of these lanthanide-organic complexes are detailed.

Original language	English (US)
Pages (from-to)	371-376
Number of pages	6
Journal	Materials Research Society Symposium - Proceedings
Volume	623
DOIs	https://doi.org/10.1557/proc-623-371
State	Published - Jan 1 2000
Event	Materials Science of Novel Oxide-Based Electronics - San Francisco, CA, United States Duration: Apr 24 2000 → Apr 27 2000

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Access to Document

10.1557/proc-623-371

Cite this

@article{7a62e03fa4724edcac3f4ce96705977e,

title = "Volatile, fluorine-free β-ketoiminate precursors for MOCVD growth of lanthanide oxide thin films",

abstract = "Lanthanide oxide thin films are of increasing scientific and technological interest to the materials science community. A new class of fluorine-free, volatile, low-melting lanthanide precursors for the metal-organic chemical vapor deposition (MOCVD) of these films has been developed. Initial results from a full synthetic study of these lanthanide-organic complexes are detailed.",

author = "Edleman, {N. L.} and Belot, {J. A.} and Babcock, {J. R.} and Metz, {A. W.} and Metz, {M. V.} and Stern, {C. L.} and Marks, {T. J.}",

year = "2000",

month = jan,

day = "1",

doi = "10.1557/proc-623-371",

language = "English (US)",

volume = "623",

pages = "371--376",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

note = "Materials Science of Novel Oxide-Based Electronics ; Conference date: 24-04-2000 Through 27-04-2000",

}

TY - JOUR

T1 - Volatile, fluorine-free β-ketoiminate precursors for MOCVD growth of lanthanide oxide thin films

AU - Edleman, N. L.

AU - Belot, J. A.

AU - Babcock, J. R.

AU - Metz, A. W.

AU - Metz, M. V.

AU - Stern, C. L.

AU - Marks, T. J.

PY - 2000/1/1

Y1 - 2000/1/1

N2 - Lanthanide oxide thin films are of increasing scientific and technological interest to the materials science community. A new class of fluorine-free, volatile, low-melting lanthanide precursors for the metal-organic chemical vapor deposition (MOCVD) of these films has been developed. Initial results from a full synthetic study of these lanthanide-organic complexes are detailed.

AB - Lanthanide oxide thin films are of increasing scientific and technological interest to the materials science community. A new class of fluorine-free, volatile, low-melting lanthanide precursors for the metal-organic chemical vapor deposition (MOCVD) of these films has been developed. Initial results from a full synthetic study of these lanthanide-organic complexes are detailed.

UR - http://www.scopus.com/inward/record.url?scp=0034448976&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0034448976&partnerID=8YFLogxK

U2 - 10.1557/proc-623-371

DO - 10.1557/proc-623-371

M3 - Conference article

AN - SCOPUS:0034448976

SN - 0272-9172

VL - 623

SP - 371

EP - 376

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

T2 - Materials Science of Novel Oxide-Based Electronics

Y2 - 24 April 2000 through 27 April 2000

ER -

Volatile, fluorine-free β-ketoiminate precursors for MOCVD growth of lanthanide oxide thin films

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this