Wafer-scale silica optomechanical oscillators with low threshold power and low phase noise for monolithic optical frequency references

A. J. Grine*, N. Quack, K. Grutter, T. O. Rocheleau, J. Huang, C. T C Nguyen, M. C. Wu

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Scopus citations

Abstract

We present wafer-scale processed optomechanical oscillators with low threshold power (120μW) owing to high Qoptical 5.3M, with phase noise of 110dBc/Hz (10kHz offset, 18.6MHz carrier). Phase noise is modeled, and measured vs. Qoptical and Qmechanical.

Original languageEnglish (US)
Title of host publication2012 International Conference on Optical MEMS and Nanophotonics, OMN 2012
Pages51-52
Number of pages2
DOIs
StatePublished - Nov 22 2012
Event2012 International Conference on Optical MEMS and Nanophotonics, OMN 2012 - Banff, AB, Canada
Duration: Aug 6 2012Aug 9 2012

Other

Other2012 International Conference on Optical MEMS and Nanophotonics, OMN 2012
CountryCanada
CityBanff, AB
Period8/6/128/9/12

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

Fingerprint Dive into the research topics of 'Wafer-scale silica optomechanical oscillators with low threshold power and low phase noise for monolithic optical frequency references'. Together they form a unique fingerprint.

  • Cite this

    Grine, A. J., Quack, N., Grutter, K., Rocheleau, T. O., Huang, J., Nguyen, C. T. C., & Wu, M. C. (2012). Wafer-scale silica optomechanical oscillators with low threshold power and low phase noise for monolithic optical frequency references. In 2012 International Conference on Optical MEMS and Nanophotonics, OMN 2012 (pp. 51-52). [6318797] https://doi.org/10.1109/OMEMS.2012.6318797