Water dissociation on boron-doped single crystal Ni3(Al, Ti) (110) surface

Jinliu Wang*, Beizhi Zhou, Yip-Wah Chung

*Corresponding author for this work

Research output: Contribution to journalArticle

1 Scopus citations

Abstract

Previous work demonstrated that water dissociates into hydrogen on the Ni3(Al, Ti) (100) surface. There is clear evidence that this dissociation reaction results in the reduced ductility of many polycrystalline aluminum-based alloys in a moist environment. Ductility measurements further showed that microalloying with boron markedly improves the ductility of these polycrystalline alloys. To explore the effect of boron, we first dosed the surface of clean Ni3(Al, Ti) (110) with controlled amounts of boron, using a specially designed low-energy boron ion source, followed by low-temperature exposure to D2O and temperature-programmed desorption. Results indicated that water dissociates into atomic hydrogen on clean Ni3(Al, Ti) (110) boron-free surface, which was further verified by x-ray photoemission studies. This dissociation reaction is strongly suppressed by boron adsorption at a coverage of 0.25 monolayer. Auger studies on boron-modified surfaces showed that boron is oxidized in this process. These studies indicated that addition of boron suppresses water dissociation into atomic hydrogen. The significance of this observation will be discussed.

Original languageEnglish (US)
Pages (from-to)259-267
Number of pages9
JournalProceedings of the TMS Fall Meeting
StatePublished - Dec 1 1999

ASJC Scopus subject areas

  • Engineering(all)

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