TY - JOUR
T1 - Water dissociation on boron-doped single crystal Ni3(Al, Ti) (110) surface
AU - Wang, Jinliu
AU - Zhou, Beizhi
AU - Chung, Yip-Wah
PY - 1999/12/1
Y1 - 1999/12/1
N2 - Previous work demonstrated that water dissociates into hydrogen on the Ni3(Al, Ti) (100) surface. There is clear evidence that this dissociation reaction results in the reduced ductility of many polycrystalline aluminum-based alloys in a moist environment. Ductility measurements further showed that microalloying with boron markedly improves the ductility of these polycrystalline alloys. To explore the effect of boron, we first dosed the surface of clean Ni3(Al, Ti) (110) with controlled amounts of boron, using a specially designed low-energy boron ion source, followed by low-temperature exposure to D2O and temperature-programmed desorption. Results indicated that water dissociates into atomic hydrogen on clean Ni3(Al, Ti) (110) boron-free surface, which was further verified by x-ray photoemission studies. This dissociation reaction is strongly suppressed by boron adsorption at a coverage of 0.25 monolayer. Auger studies on boron-modified surfaces showed that boron is oxidized in this process. These studies indicated that addition of boron suppresses water dissociation into atomic hydrogen. The significance of this observation will be discussed.
AB - Previous work demonstrated that water dissociates into hydrogen on the Ni3(Al, Ti) (100) surface. There is clear evidence that this dissociation reaction results in the reduced ductility of many polycrystalline aluminum-based alloys in a moist environment. Ductility measurements further showed that microalloying with boron markedly improves the ductility of these polycrystalline alloys. To explore the effect of boron, we first dosed the surface of clean Ni3(Al, Ti) (110) with controlled amounts of boron, using a specially designed low-energy boron ion source, followed by low-temperature exposure to D2O and temperature-programmed desorption. Results indicated that water dissociates into atomic hydrogen on clean Ni3(Al, Ti) (110) boron-free surface, which was further verified by x-ray photoemission studies. This dissociation reaction is strongly suppressed by boron adsorption at a coverage of 0.25 monolayer. Auger studies on boron-modified surfaces showed that boron is oxidized in this process. These studies indicated that addition of boron suppresses water dissociation into atomic hydrogen. The significance of this observation will be discussed.
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M3 - Article
AN - SCOPUS:0033299611
SP - 259
EP - 267
JO - Proceedings of the TMS Fall Meeting
JF - Proceedings of the TMS Fall Meeting
ER -