Water dissociation on clean and boron-modified single-crystal Ni3(Al,Ti) (110) surfaces

Jinliu Wang; Yip Wah Chung

doi:10.1021/jp993388x

Water dissociation on clean and boron-modified single-crystal Ni₃(Al,Ti) (110) surfaces

Jinliu Wang, Yip Wah Chung^*

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

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Abstract

The interaction of water vapor with clean and boron-modified Ni₃(Al,Ti) surfaces was studied with temperature-programmed desorption, X-ray photoemission, and Auger electron spectroscopy. Thermal desorption results indicate that water dissociates on clean boron-free Ni₃(Al,Ti) (110) surfaces, resulting in hydrogen evolution at ∼400 K. X-ray photoemission studies show that water dissociation occurs above 190 K. Hydrogen desorption at ∼400 K is completely suppressed by boron adsorption at a coverage of about 0.3 monolayer. Auger and X-ray photoemission studies on boron-modified Ni₃(Al,Ti) (110) surfaces show that boron reacts with water to form hydroxyl at 130-190 K. Hydrogen desorption occurs at ∼950 K from boron-modified Ni₃(Al.Ti) (110) surfaces, indicating strong B-H bonding.

Original language	English (US)
Pages (from-to)	3219-3223
Number of pages	5
Journal	Journal of Physical Chemistry B
Volume	104
Issue number	14
DOIs	https://doi.org/10.1021/jp993388x
State	Published - Apr 13 2000

ASJC Scopus subject areas

Physical and Theoretical Chemistry
Surfaces, Coatings and Films
Materials Chemistry

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title = "Water dissociation on clean and boron-modified single-crystal Ni3(Al,Ti) (110) surfaces",

abstract = "The interaction of water vapor with clean and boron-modified Ni3(Al,Ti) surfaces was studied with temperature-programmed desorption, X-ray photoemission, and Auger electron spectroscopy. Thermal desorption results indicate that water dissociates on clean boron-free Ni3(Al,Ti) (110) surfaces, resulting in hydrogen evolution at ∼400 K. X-ray photoemission studies show that water dissociation occurs above 190 K. Hydrogen desorption at ∼400 K is completely suppressed by boron adsorption at a coverage of about 0.3 monolayer. Auger and X-ray photoemission studies on boron-modified Ni3(Al,Ti) (110) surfaces show that boron reacts with water to form hydroxyl at 130-190 K. Hydrogen desorption occurs at ∼950 K from boron-modified Ni3(Al.Ti) (110) surfaces, indicating strong B-H bonding.",

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T1 - Water dissociation on clean and boron-modified single-crystal Ni3(Al,Ti) (110) surfaces

AU - Wang, Jinliu

AU - Chung, Yip Wah

PY - 2000/4/13

Y1 - 2000/4/13

N2 - The interaction of water vapor with clean and boron-modified Ni3(Al,Ti) surfaces was studied with temperature-programmed desorption, X-ray photoemission, and Auger electron spectroscopy. Thermal desorption results indicate that water dissociates on clean boron-free Ni3(Al,Ti) (110) surfaces, resulting in hydrogen evolution at ∼400 K. X-ray photoemission studies show that water dissociation occurs above 190 K. Hydrogen desorption at ∼400 K is completely suppressed by boron adsorption at a coverage of about 0.3 monolayer. Auger and X-ray photoemission studies on boron-modified Ni3(Al,Ti) (110) surfaces show that boron reacts with water to form hydroxyl at 130-190 K. Hydrogen desorption occurs at ∼950 K from boron-modified Ni3(Al.Ti) (110) surfaces, indicating strong B-H bonding.

AB - The interaction of water vapor with clean and boron-modified Ni3(Al,Ti) surfaces was studied with temperature-programmed desorption, X-ray photoemission, and Auger electron spectroscopy. Thermal desorption results indicate that water dissociates on clean boron-free Ni3(Al,Ti) (110) surfaces, resulting in hydrogen evolution at ∼400 K. X-ray photoemission studies show that water dissociation occurs above 190 K. Hydrogen desorption at ∼400 K is completely suppressed by boron adsorption at a coverage of about 0.3 monolayer. Auger and X-ray photoemission studies on boron-modified Ni3(Al,Ti) (110) surfaces show that boron reacts with water to form hydroxyl at 130-190 K. Hydrogen desorption occurs at ∼950 K from boron-modified Ni3(Al.Ti) (110) surfaces, indicating strong B-H bonding.

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Water dissociation on clean and boron-modified single-crystal Ni₃(Al,Ti) (110) surfaces

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