Water dissociation on clean and boron-modified single-crystal Ni3(Al,Ti) (110) surfaces

Jinliu Wang, Yip Wah Chung*

*Corresponding author for this work

Research output: Contribution to journalArticle

10 Scopus citations

Abstract

The interaction of water vapor with clean and boron-modified Ni3(Al,Ti) surfaces was studied with temperature-programmed desorption, X-ray photoemission, and Auger electron spectroscopy. Thermal desorption results indicate that water dissociates on clean boron-free Ni3(Al,Ti) (110) surfaces, resulting in hydrogen evolution at ∼400 K. X-ray photoemission studies show that water dissociation occurs above 190 K. Hydrogen desorption at ∼400 K is completely suppressed by boron adsorption at a coverage of about 0.3 monolayer. Auger and X-ray photoemission studies on boron-modified Ni3(Al,Ti) (110) surfaces show that boron reacts with water to form hydroxyl at 130-190 K. Hydrogen desorption occurs at ∼950 K from boron-modified Ni3(Al.Ti) (110) surfaces, indicating strong B-H bonding.

Original languageEnglish (US)
Pages (from-to)3219-3223
Number of pages5
JournalJournal of Physical Chemistry B
Volume104
Issue number14
DOIs
StatePublished - Apr 13 2000

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Materials Chemistry

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