Work function mapping of MoOx thin-films for application in electronic devices

André L.F. Cauduro; Roberto dos Reis; Gong Chen; Andreas K. Schmid; Horst Günter Rubahn; Morten Madsen

doi:10.1016/j.ultramic.2017.03.025

Work function mapping of MoO_x thin-films for application in electronic devices

André L.F. Cauduro^*, Roberto dos Reis, Gong Chen, Andreas K. Schmid, Horst Günter Rubahn, Morten Madsen

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

Abstract

The knowledge of the structural and electronic surface morphology is imperative to fully understand the charge transfer at interfaces of electronic devices, such as in photovoltaic (PV) cells. To this aim, here, we use low-energy electron microscopy to probe the unoccupied states of post-annealed MoO_x thin-films grown in oxygen excess (x∼3.16) and deficient (x∼2.57) environments. 2D work function maps are correlated with the surface topography extracted by mirror electron microscopy (MEM) mode, which show homogenous surface morphology and electronic levels for the specimen with x∼2.57, while it demonstrates nanoaggregates with different work functions on top of flat surface areas for the sample grown with x∼3.16.

Original language	English (US)
Pages (from-to)	1339-1351
Number of pages	13
Journal	Ultramicroscopy
Volume	183
DOIs	https://doi.org/10.1016/j.ultramic.2017.03.025
State	Published - Dec 2017

Funding

A.L.F.C. thanks the CNPq Brazilian Council for providing a scholarship under Process no 213909-2012-0. Work at the Molecular Foundry was supported by the Office of Science , Office of Basic Energy Sciences , of the U.S. Department of Energy under Contract No. DE-AC02-05CH11231 . The research leading to these results has received funding from the People Programme (Marie Curie Actions) of the European Union's Seventh Framework Programme FP7 / 2007–2013/under REA Grant Agreement No. 607232, THINFACE. A.L.F.C. thanks the CNPq Brazilian Council for providing a scholarship under Process no 213909-2012-0. Work at the Molecular Foundry was supported by the Office of Science, Office of Basic Energy Sciences, of the U.S. Department of Energy under Contract No. DE-AC02-05CH11231. The research leading to these results has received funding from the People Programme (Marie Curie Actions) of the European Union's Seventh Framework Programme FP7/ 2007?2013/under REA Grant Agreement No. 607232, THINFACE.

Keywords

Leem
MoO thin-films
Morphology
Reactive sputtering
Surface aggregation
Work function

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Instrumentation

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

Access to Document

10.1016/j.ultramic.2017.03.025

Cite this

@article{0772b7c0080d47d6acb736728a124445,

title = "Work function mapping of MoOx thin-films for application in electronic devices",

abstract = "The knowledge of the structural and electronic surface morphology is imperative to fully understand the charge transfer at interfaces of electronic devices, such as in photovoltaic (PV) cells. To this aim, here, we use low-energy electron microscopy to probe the unoccupied states of post-annealed MoOx thin-films grown in oxygen excess (x∼3.16) and deficient (x∼2.57) environments. 2D work function maps are correlated with the surface topography extracted by mirror electron microscopy (MEM) mode, which show homogenous surface morphology and electronic levels for the specimen with x∼2.57, while it demonstrates nanoaggregates with different work functions on top of flat surface areas for the sample grown with x∼3.16.",

keywords = "Leem, MoO thin-films, Morphology, Reactive sputtering, Surface aggregation, Work function",

author = "Cauduro, {Andr{\'e} L.F.} and {dos Reis}, Roberto and Gong Chen and Schmid, {Andreas K.} and Rubahn, {Horst G{\"u}nter} and Morten Madsen",

note = "Publisher Copyright: {\textcopyright} 2017",

year = "2017",

month = dec,

doi = "10.1016/j.ultramic.2017.03.025",

language = "English (US)",

volume = "183",

pages = "1339--1351",

journal = "Ultramicroscopy",

issn = "0304-3991",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Work function mapping of MoOx thin-films for application in electronic devices

AU - Cauduro, André L.F.

AU - dos Reis, Roberto

AU - Chen, Gong

AU - Schmid, Andreas K.

AU - Rubahn, Horst Günter

AU - Madsen, Morten

PY - 2017/12

Y1 - 2017/12

N2 - The knowledge of the structural and electronic surface morphology is imperative to fully understand the charge transfer at interfaces of electronic devices, such as in photovoltaic (PV) cells. To this aim, here, we use low-energy electron microscopy to probe the unoccupied states of post-annealed MoOx thin-films grown in oxygen excess (x∼3.16) and deficient (x∼2.57) environments. 2D work function maps are correlated with the surface topography extracted by mirror electron microscopy (MEM) mode, which show homogenous surface morphology and electronic levels for the specimen with x∼2.57, while it demonstrates nanoaggregates with different work functions on top of flat surface areas for the sample grown with x∼3.16.

AB - The knowledge of the structural and electronic surface morphology is imperative to fully understand the charge transfer at interfaces of electronic devices, such as in photovoltaic (PV) cells. To this aim, here, we use low-energy electron microscopy to probe the unoccupied states of post-annealed MoOx thin-films grown in oxygen excess (x∼3.16) and deficient (x∼2.57) environments. 2D work function maps are correlated with the surface topography extracted by mirror electron microscopy (MEM) mode, which show homogenous surface morphology and electronic levels for the specimen with x∼2.57, while it demonstrates nanoaggregates with different work functions on top of flat surface areas for the sample grown with x∼3.16.

KW - Leem

KW - MoO thin-films

KW - Morphology

KW - Reactive sputtering

KW - Surface aggregation

KW - Work function

UR - http://www.scopus.com/inward/record.url?scp=85017135297&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85017135297&partnerID=8YFLogxK

U2 - 10.1016/j.ultramic.2017.03.025

DO - 10.1016/j.ultramic.2017.03.025

M3 - Article

C2 - 28396081

AN - SCOPUS:85017135297

SN - 0304-3991

VL - 183

SP - 1339

EP - 1351

JO - Ultramicroscopy

JF - Ultramicroscopy

ER -