Work function mapping of MoOx thin-films for application in electronic devices

André L.F. Cauduro*, Roberto dos Reis, Gong Chen, Andreas K. Schmid, Horst Günter Rubahn, Morten Madsen

*Corresponding author for this work

Research output: Contribution to journalArticle

6 Scopus citations

Abstract

The knowledge of the structural and electronic surface morphology is imperative to fully understand the charge transfer at interfaces of electronic devices, such as in photovoltaic (PV) cells. To this aim, here, we use low-energy electron microscopy to probe the unoccupied states of post-annealed MoOx thin-films grown in oxygen excess (x∼3.16) and deficient (x∼2.57) environments. 2D work function maps are correlated with the surface topography extracted by mirror electron microscopy (MEM) mode, which show homogenous surface morphology and electronic levels for the specimen with x∼2.57, while it demonstrates nanoaggregates with different work functions on top of flat surface areas for the sample grown with x∼3.16.

Original languageEnglish (US)
Pages (from-to)1339-1351
Number of pages13
JournalUltramicroscopy
Volume183
DOIs
StatePublished - Dec 2017

Keywords

  • Leem
  • MoO thin-films
  • Morphology
  • Reactive sputtering
  • Surface aggregation
  • Work function

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Instrumentation

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