X-ray holographic microscopy using photoresists

Chris Jacobsen, Malcolm Howells, Janos Kirz, Stephen Rothman

Research output: Contribution to journalArticlepeer-review

90 Scopus citations

Abstract

Gabor x-ray holograms of biological specimens and of test objects that display <56-nm resolution are presented. This spatial resolution is more than an order of magnitude smaller than what has been achieved previously in x-ray holography. The holograms were recorded on photoresist using 2.57-nm soft x rays from the X—17t undulator at the National Syncrotron Light Source at Brookhaven National Laboratory. The processed photoresists were enlarged with an electron microscope and digitized using a scanning microdensitometer; the digitized holograms were reconstructed numerically. The exposure requirements were in good agreement with simple theory. The method offers promise as a technique for soft-x-ray microscopy.

Original languageEnglish (US)
Pages (from-to)1847-1861
Number of pages15
JournalJournal of the Optical Society of America A: Optics and Image Science, and Vision
Volume7
Issue number10
DOIs
StatePublished - Oct 1990

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Computer Vision and Pattern Recognition

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