X-ray induced, substrate-carrier mediated deposition of metal on GaAs

Qing Ma; R. Divan; D. C. Mancini; R. A. Rosenberg; J. P. Quintana; D. T. Keane

doi:10.1063/1.2336592

X-ray induced, substrate-carrier mediated deposition of metal on GaAs

Qing Ma^*, R. Divan, D. C. Mancini, R. A. Rosenberg, J. P. Quintana, D. T. Keane

^*Corresponding author for this work

NRSC - Northwestern Synchrotron Research Center - DND CAT

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

A wet metal deposition process on GaAs surfaces is described. The process is induced by high energy x-ray photons and is mediated by photon-generated carriers through the photoelectrochemical mechanism similar to that for light-induced wet etching. The micrometer to submicrometer feature fabrication using this process is demonstrated.

Original language	English (US)
Article number	083114
Journal	Applied Physics Letters
Volume	89
Issue number	8
DOIs	https://doi.org/10.1063/1.2336592
State	Published - Aug 31 2006

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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title = "X-ray induced, substrate-carrier mediated deposition of metal on GaAs",

abstract = "A wet metal deposition process on GaAs surfaces is described. The process is induced by high energy x-ray photons and is mediated by photon-generated carriers through the photoelectrochemical mechanism similar to that for light-induced wet etching. The micrometer to submicrometer feature fabrication using this process is demonstrated.",

author = "Qing Ma and R. Divan and Mancini, {D. C.} and Rosenberg, {R. A.} and Quintana, {J. P.} and Keane, {D. T.}",

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AU - Mancini, D. C.

AU - Rosenberg, R. A.

AU - Quintana, J. P.

AU - Keane, D. T.

PY - 2006/8/31

Y1 - 2006/8/31

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AB - A wet metal deposition process on GaAs surfaces is described. The process is induced by high energy x-ray photons and is mediated by photon-generated carriers through the photoelectrochemical mechanism similar to that for light-induced wet etching. The micrometer to submicrometer feature fabrication using this process is demonstrated.

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