X-ray reflectivity study on gold films during sputter deposition

R. P. Chiarello*, H. You, H. K. Kim, T. Roberts, R. T. Kempwirth, D. Miller, K. E. Gray, K. G. Vandervoort, N. Trivedi, S. R. Phillpot, Q. J. Zhang, S. Williams, J. B. Ketterson

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

We performed in-situ X-ray reflectivity measurements of gold films during sputter deposition on polished silicon substrates. The measurements were performed at several substrate temperatures and under two argon pressures. The gold surfaces were also examined by scanning tunneling microscopy after deposition to obtain their real-space topographic images. These images were used to complement the X-ray reflectivity measurements in determining the effect of argon pressure on the gold surface and its height-height difference functions. An approximation for height-height difference functions was employed to analyze the X-ray reflectivity data. The measured interface width during growth followed a simple power law, consistent with recent theoretical results of dynamic scaling behavior. The scaling exponents, however, do not agree well with predictions based on some models in 2 + 1 dimensions.

Original languageEnglish (US)
Pages (from-to)245-257
Number of pages13
JournalSurface Science
Volume380
Issue number2-3
DOIs
StatePublished - May 15 1997

Keywords

  • Atomic force microscopy
  • Gold
  • Growth
  • Metallic films
  • Metallic surfaces
  • Models of non-equilibrium phenomena
  • Non-equilibrium thermodynamics and statistical mechanics
  • Polycrystalline surfaces
  • Polycrystalline thin films
  • Scanning tunneling microscopy

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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