Abstract
We performed in-situ X-ray reflectivity measurements of gold films during sputter deposition on polished silicon substrates. The measurements were performed at several substrate temperatures and under two argon pressures. The gold surfaces were also examined by scanning tunneling microscopy after deposition to obtain their real-space topographic images. These images were used to complement the X-ray reflectivity measurements in determining the effect of argon pressure on the gold surface and its height-height difference functions. An approximation for height-height difference functions was employed to analyze the X-ray reflectivity data. The measured interface width during growth followed a simple power law, consistent with recent theoretical results of dynamic scaling behavior. The scaling exponents, however, do not agree well with predictions based on some models in 2 + 1 dimensions.
Original language | English (US) |
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Pages (from-to) | 245-257 |
Number of pages | 13 |
Journal | Surface Science |
Volume | 380 |
Issue number | 2-3 |
DOIs | |
State | Published - May 15 1997 |
Keywords
- Atomic force microscopy
- Gold
- Growth
- Metallic films
- Metallic surfaces
- Models of non-equilibrium phenomena
- Non-equilibrium thermodynamics and statistical mechanics
- Polycrystalline surfaces
- Polycrystalline thin films
- Scanning tunneling microscopy
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry