Abstract
X-ray standing wave (XSW) analysis was used for an atomic-scale structural study of ultra-thin Si/Ge heterostructures grown on Si(0 0 1) by surfactant mediated epitaxy with Bi as the surfactant. XSW measurements were performed for the Si(0 0 4) and Si(0 2 2) Bragg reflections for Ge coverages from 1 to 10 monolayers. The measured Ge coherent positions agree with the calculated Ge positions for a tetragonally distorted Ge lattice formed on Si(0 0 1) using continuum elasticity theory. However, the measured Ge coherent fractions are smaller than expected. The quality of the Si cap layer and its registry with the underlying Si(0 0 1) substrate lattice was also determined by combining the XSW technique with evanescent-wave emission.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 1-10 |
| Number of pages | 10 |
| Journal | Surface Science |
| Volume | 529 |
| Issue number | 1-2 |
| DOIs | |
| State | Published - Apr 1 2003 |
| Externally published | Yes |
Funding
We would like to thank D.L. Marasco and D.A. Walko for their help in setting up the XSW experiments. We are also grateful to P. Baldo at ANL for RBS measurements. The work was supported by the US Department of Energy/BES under contract W-31-109-Eng-38 to ANL and by the National Science Foundation under contracts DMR-0076097 and DMR-9973436, and by the State of Illinois under contract IBHE HECA NWU 96.
Keywords
- Bismuth
- Epitaxy
- Germanium
- Growth
- Silicon
- Surface defects
- X-ray standing waves
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry